© Erwin Schrödinger Society for Nanosciences.


About the ESG

The Erwin Schrödinger Society for Nanosciences was founded in 1986 with its original name "Erwin Schrödinger Society for Microsciences". It is a unique community of researchers, sponsors and idealists in Austria, who actively contribute to the propagation of knowledge and technology in the field of nanoscience. With the establishment of Erwin Schrödinger Institutes, the society promotes internationally recognised pioneering work in current fields of research.

By exploration of structures in the nanometer scale (10-9m), nanoscience and nanotechnology are expected to drive the development of new nanostructured materials as well as systems for biotechnology and information technology. This requires the development of new tools and processes that operate on a nanometer scale and pave the way for this new technology in the world of atoms and molecules. The obtained know-how will result in novel products that are optimised by nanotechnology.

The ESG-Nano provided important pioneering work in the field of nanoscience in Austria. On the occasion of its 20th anniversary, Senator h.c. Dr. N. Rozsenich presented a detailed review: "The role of the ESG for the development of Nanoscience in Austria", ("Die Rolle der ESG in der Entwicklung der Nanowissenschaften in Österreich", PDF, German, 433 kb)

Converging technologies

The board of the ESG

President Univ.Prof. Dr.rer.nat. Eva-Kathrin Ehmoser University of Natural Resources and Life Sciences, Vienna
Vice presidents Univ.-Prof. Dipl.-Ing. Dr. Wolfgang Kautek University of Vienna
ao. Univ.-Prof. Dr. Ruth Prassl Medical University of Graz
Treasurers Dr. Oskar Armbruster University of Vienna
Dr. Aida Naghilou University of Vienna
Secretaries Dr. Hans Löschner IMS, Wien
Ulrich Pacher University of Vienna
Assessors o.Univ.-Prof. Dr. Franz Aussenegg University of Graz
Univ.-Prof. Dr. Wolfgang Knoll AIT Austrian Institute of Technology
Dr. Franz R. Krejs Horizonte Venture Management GmbH, Vienna
o.Univ.-Prof. Dr. Ulrich Schubert TU Wien
o.Univ.-Prof. Dr. Peter Schuster University of Vienna
o.Univ.-Prof. Dr. Uwe B. Sleytr University of Natural Resources and Life Sciences, Vienna
Additional functions
Secretary general Dr. Oskar Armbruster University of Vienna
Auditors Assoc.-Prof. Dipl.-Ing. Dr.techn. Ilse-Christine Gebeshuber TU Wien
Univ.-Prof. Dr. Thomas Klar Johannes Kepler University Linz


ESG-Institute for Nanoscale Research
Head: Univ.Prof. Dr. Franz Aussenegg
Karl-Franzens-University Graz
Universitätsplatz 5
8010 Graz, Austria
Phone: +43 (316) 380 5186
Fax: +43 (316) 380 9816
e-Mail: franz.aussenegg@uni-graz.at

The Erwin Schrödinger Institute for Nanoscale Research was founded in 1990 and is integrated with the Department of Physics (Optics and Laser Technology) at the Karl-Franzens-University, Graz. Its mission is to prepare results from the university department's basic research activities for technological applications. Within the frame work of many research projects, topics in micro- and nanooptics have been intensively examined in recent years (see http://nanooptics.uni-graz.at/). These activities have resulted in specialised knowledge of basic physical principles in the field of micro- and nanooptics, but also technological know-how regarding instrumentation for nanostructure research and nanoanalytics.
ESG-Institute for Lithography Research (ILF)
Head: Dr. Michael Mühlberger
Im Stadtgut A2
A-4407 Steyr-Gleink
Tel: (+43-0) 7252 885 253
Fax: (+43-0) 7252 885 101
Web: http://www.profactor.at/
Deputy: Univ. Lektor Günther Stangl
Institute of Sensor and Actuator Systems
TU Wien
Gusshausstrasse 27/3663
A-1040 Wien
Tel: +43 (1) 58801-36672
Fax: +43 (1) 58801-36699
Web: http://www.isas.tuwien.ac.at/

Since 2013 the ILF is located at the Department Functional Surfaces and Nanostructures at PROFACTOR (https://www.profactor.at/forschung/additive-mikronano-fertigung/).

The research efforts focus on Nanoimprint Lithography and especially on Roll-to-Plate (R2P) Nanoimprinting and Nanoimprinting on curved surfaces (3D-NIL).

With R2P we aim at large area rigid substrates (e.g. glass plates 20x60cm²) and high throughput nanoimprinting for optical and life science applications. Our efforts to bring nanostructures on complex (also 3d-printed) objects using 3D-NIL find applications in the areas of optics and medical research. Furthermore we are working on conventional nanoimprinting with a focus on special processes like e.g. replicating undercut nanostructures.

The following 3 posters were presented at the 3rd Erwin Schrödinger Symposium 2018 in Dornbirn and show some recent examples of our work:

ESG-Institute for Lithography Research (ILF) @ FH Vorarlberg (until 2013)
The Erwin Schrödinger Institute for Lithography Research (ILF) developed and constructed Dust-Collecting-Units for the space probe Rosetta. These units are made of silicon brushes consisting of 50 million pins per cm2 and silicon facets spun with a SOL-GEL coating. Extraterrestrial dust particles in the nanometer range are captured and retained for instant investigations. The SOL-Gel used was also synthesized at the ILF. The spacecraft currently continues its path around the sun.

The ILF successfully produced sputtered thin films (20 to 40 nanometer thick) of permalloy with a magnetoresistive (MR) effect of 3.96. This is close to the theoretical maximum of MR = 4.00. This technology enables the design of positioning sensors with a repeat accuracy of 50 nanometers or better; furthermore a specially developed sensor layout allowed to recognize a magnetic field fluctuation in the region of pico-Tesla.

The ILF also developed a low cost high resolution (1:1) mask aligner technology that allows high resolution patterning down to 150 nm line/space gratings over large areas. A standard mask aligner was modified at the Vorarlberg University of Applied Sciences. An ArF Excimer laser at 193 nm wavelength was coupled into the system. Different DUV resist materials can be tested. The etch selectivity of DUV resist materials was demonstrated by pattern transfer using RIE.

  150 nm lines & spaces patterned with the modified DUV mask aligner and transferred into silicon by dry etching.

Additional laser activities in collaboration with High Q Laser Production GmbH are in the field of selective laser ablation as a process step in MEMS fabrication. By employing pulses with a duration of 350 fs (System: femtoREGEN™ by High Q Laser), mask and developmentless structuring of various material layers like thick photoresist, transparent conductive oxides or metals is possible without damaging the substrate. Ultrashort pulse durations permit structuring almost free of any heat load to the material due to the suppressed thermal diffusion.

  Laser structured microfluidic sensor chip, directly ablated with a wavelength of 520 nm; SU-8-layer with a thickness of 280 µm on a glass wafer (collaboration with TU Vienna/ISAS).

The simulation and optimization of high-resolution electron beam lithography processes for maskless lithography (ML2) working with massively parallel electron beams. This work has been carried out in the FP6 and FP7 EC programmes "RIMANA" under coordination of IMS Nanofabrication AG of Vienna and "MAGIC" under coordination of CEA LETI, and other partners, among these IMS Nanofabrication AG leading the work package on projection maskless lithography (PML2).
Another lithography related project ("MALS" Mask Aligner Lithography Simulation) relates to the simulation of contact- and proximity (1:1) printing under coordination of GenISys GmbH, Munich, together with Fraunhofer IISB Erlangen and SUSS Microtech, Munich.
ILF is also partially participating in the Austrian project cluster "NILaustria" dealing with the development of nanoimprint lithography under the coordination of Profactor GmbH.

  Simulation of artifacts occurring on the end of printed lines in resist using i-line proximity printing with 600 nm gap (Layout LAB,GenISys).