© 2006 Erwin Schrödinger Society for Nanosciences.
- Science and Technology
The Erwin Schrödinger Society for Nanosciences was founded in 1986 with its original name "Erwin Schrödinger Society for Microsciences". It is a unique community of researchers, sponsors and idealists in Austria, who actively contribute to the propagation of knowledge and technology in the field of nanoscience. With the establishment of Erwin Schrödinger Institutes, the society promotes internationally recognised pioneering work in current fields of research.
By exploration of structures in the nanometer scale (10-9 m), nanoscience and nanotechnology are expected to drive the development of new nanostructured materials as well as systems for biotechnology and information technology. This requires the development of new tools and processes that operate on a nanometer scale and pave the way for this new technology in the world of atoms and molecules. The obtained know-how will result in novel products that are optimised by nanotechnology.
3D-Model of an S-layer with square lattice symmetry. Bar=10nm
Center for NanoBiotechnology, University of Natural Resources and Applied Life Sciences, Vienna.
The ESG-Nano provided important pioneering work in the field of nanoscience in Austria. On the occasion of its 20th anniversary, Senator h.c. Dr. N. Rozsenich presented a detailed review:
"The role of the ESG for the development of Nanoscience in Austria", („Die Rolle der ESG in der Entwicklung der Nanowissenschaften in Österreich“, PDF, German, 433 kb)
ESG-Institute for Nanoscale Research
Head: Univ.Prof. Dr. Franz Aussenegg
8010 Graz, Austria
Phone: +43 (316) 380 5186
Fax: +43 (316) 380 9816
The Erwin Schrödinger Institute for Nanoscale Research was founded in 1990 and is integrated
with the Department of Physics (Optics and Laser Technology) at the Karl-Franzens-University, Graz. Its mission is to prepare of results from the university department's basic research activities for technological applications. Within the frame work of many research projects, topics in micro- and nanooptics have been intensively examined in recent years (see http://nanooptics.uni-graz.at/). These activities have resulted in specialised knowledge of basic physical principles in the field of micro- and nanooptics, but also technological know-how regarding instrumentation for nanostructure research and nanoanalytics.
Currently, the focus is on application-oriented research projects in collaboration with external research (JOANNEUM RESEARCH Forschungsgesellschaft mbH) and industrial partners (AT&S Austria Technologie & Systemtechnik AG).
for Lithography Research (ILF)
Dr. Peter Hudek
Research Centre for Microtechnology
Vorarlberg University of Applied Sciences
Tel: +43 (0) 5572 792 7202
Fax: +43 (0) 5572 792 9501
|Deputy: Univ. Lektor Günther
Institute of Sensor and Actuator Systems
Vienna University of Technology
Tel: +43 (1) 58801-36672
Fax: +43 (1) 58801-36699
The Erwin Schrödinger Institute for
Lithography Research (ILF) developed and constructed Dust-Collecting-Units
for the space probe Rosetta.
These units are made of silicon brushes consisting of 50 million
pins per cm2 and silicon facets spun with a SOL-GEL coating.
Extraterrestrial dust particles in the nanometer range are
captured and retained for instant investigations. The SOL-Gel
used was also synthesized at the ILF. The spacecraft currently
continues its path around the Sun.
The ILF successfully produced sputtered thin films (20 to
40 nanometer thick) of permalloy with a magnotoresistive (MR)
effect of 3.96. This is close to the theoretical maximum of
MR = 4.00. This technology enables the design of positioning
sensors with a repeat accuracy of 50 nanometers or better;
furthermore a specially developed sensor layout allowed to
recognize a magnetic field fluctuation in the region of pico-Tesla.
The ILF also developed a low cost high resolution (1:1) mask
aligner technology that allows high resolution patterning
down to 150nm line/space gratings over large areas. A standard
mask aligner was modified at the Vorarlberg
University of Applied Sciences. An ArF Excimer laser at
193 nm wavelength was coupled into the system. Different DUV
resist materials can be tested. The etch selectivity of DUV
resist materials was demonstrated by pattern transfer using
lines & spaces patterned with the modified DUV mask
aligner and transferred into silicon by dry etching.
Additional laser activities in collaboration
Q Laser Production GmbH are in the field of selective
laser ablation as a process step in MEMS fabrication. By employing
pulses with a duration of 350 fs (System: femtoREGEN™
by High Q Laser), mask and developmentless structuring of
various material layers like thick photoresist, transparent
conductive oxides or metals is possible without damaging the
substrate. Ultrashort pulse durations permit structuring almost
free of any heat load to the material due to the suppressed
structured microfluidic sensor chip, directly ablated
with a wavelength of 520 nm; SU-8-layer with a thickness
of 280 µm on a glass wafer (collaboration with
The current activities at the ILF include:
The simulation and optimization of high-resolution electron
beam lithography processes for maskless lithography (ML2)
working with massively parallel electron beams. This work
has been carried out in the FP6 and FP7 EC programmes “RIMANA”
under coordination of IMS
Nanofabrication AG of Vienna and “MAGIC”
under coordination of CEA LETI,
and other partners, among these IMS Nanofabrication AG leading
the work package on projection maskless lithography (PML2)..
Another lithography related project (“MALS” Mask
Aligner Lithography Simulation) relates to the simulation
of contact- and proximity (1:1) printing under coordination
GmbH, Munich, together with Fraunhofer
IISB Erlangen and SUSS
ILF is also partially participating in the Austrian project
dealing with the development of nanoimprint lithography under
the coordination of Profactor
of artifacts occurring on the end of printed lines in
resist using i-line proximity printing with 600nm gap
for Molecular Nanobiotechnology
Head: Ao.Univ.Prof. Dipl.-Ing. Dr.techn. Dietmar
Institute of Nanobiotechnology (NBT)
University of Natural Resources and Applied Life Sciences
1190 Vienna, Austria
Phone: +43 (1) 47654-2208
Fax: +43 (1) 4789112
The ESG-Institute for Molecular Nanobiotechnology investigates and makes use of the self-assembly properties of S-layer proteins as pattering elements in the development of supramolecular structures and devices where the size of the critical features is below 10 nanometers. Key is the use of native and, in particular, genetically functionalized S-layer protein lattices as matrices for the templated synthesis or binding of nanoparticles with specific optical, electronic, catalytic or structural properties. Formation of S-layer protein monolayers on technologically relevant solid surfaces (e.g. silicon wafers, metals, polymers) are studied at molecular level by scanning probe techniques.
Research provides novel materials and technologies for life and non-life science applications which are superior to conventional approaches in terms of their fabrication efficiency. Furtheron, S-layers are used as stabilizing structures for solid supported lipid membranes. This biomimetic approach is completely new in the field of membrane protein based nanobiotechnology and is regarded as highly innovative and promising. It copies the supramolecular building principle of many archaeal cell envelopes which consist only of a plasma membrane with an associated S-layer lattice. The application potential ranges from the detection of pollutants, biological warfare agents to pharmaceutical screening and DNA sequencing.
Scanning force microscopic image of an S-layer with square lattice symmetry and a center-to-center spacing of 13.1 nm.